Inpria
1:30
Aug 2, 2022

Inpria Co-Developing Metal Oxide Resist with SK hynix to Reduce Complexity of Patterning for Next-Generation DRAM

Inpria material solutions provide the performance needed to significantly reduce the cost of EUV patterning and are compatible with proven processes and equipment configurations. Inpria’s MOR can be applied by a standard spin coating process.